Conference secretariat:

PCO Publicon
Väike-Turu 8, 
51013 Tartu
Ph: +372 740 4095











The 13th International Baltic Conference on Atomic Layer Deposition will be held in Tartu, Estonia, at the Institute of Physics of the University of Tartu on September 28–29, 2015. The conference belongs to a series of scientific meetings that was started with Atomic Layer Epitaxy (ALE) Symposium of Helsinki University of Technology and University of Tartu in 1991. The first symposium was organized in Helsinki while the second one was held in Tartu in 1993. Later the events were titled as Baltic ALE Symposium in 1995 and 1997, and Baltic ALD Symposium  since 2002.

Since its development in 1960-s and 1970-s the atomic layer deposition (ALD) technique has attracted continuously increasing interest. By now the technique occupies a key position in the list of thin-film technologies for production of nanoelectronic devices. Moreover, due to its ability to produce high-quality thin-film coatings on substrates with very complex shapes, ALD has found a number of applications in other fields of technology as well. However, in order to realize all advantages of the ALD technique and implement new processes, complex studies at the level of single atomic layers are frequently needed. Baltic ALD 2015 will provide possibilities to publish results of recent studies on ALD and to initiate and support collaboration between research groups working in this field. 

Organizing of the conference is supported by COST Action MP1402 HERALD.

Following the Baltic ALD 2015 Conference, the annual meeting of the COST project HERALD ( will be held at Dorpat Conference Center, Tartu, on September 30, 2015

Please find here the LOCATION MAP of the Conference Venue.

Last Blog Posts from ALD News Blog (Jonas Sundqvist)

Protecting silver cultural heritage objects with atomic layer deposited corrosion barriers [Open Acess]

Many ALD reactors out there are standing idle over the Christmas holidays and maybe this is a good opportunity to sneak into the lab and run some ALD protective coating on your silver silver objects you have at home. Here is an Open Source article...

MOF integration routes enabled by the MOF-CVD process by Imec & Friends

2015 - The year of The MOF - Here is yet another publication on MOF that you should download and read if you have access to Nature Materials. Here scientists at Imec (Belgium), CSIRO Manufacturing Flagship (Australia), MBI, National University of...

Aussie receive Award and spends it all on an ALD trip to Boston

I once got an award and spend it all on a trip across the Baltic pond on a 2 week trip to Helsinki to learn about in-situ ALD from the Master Anti Rahtu and twice to visit two other masters in in-situ ALD Jaan Aarik and Kaupo Kulki in Tartu,...

Self-assembled block copolymer template and ALD from Israel University of Technology

Here is a cool paper from from Technion, Israel Institute of Technology, Haifa Israel on Self-assembled block copolymer template and ALD. This is a rather hot topic for future nano patterning. They are using an ALD reactor that I did not come...

ETH Zurich prints the tiniest inkjet color picture of the world

ETH Zurich reports: Researchers of ETH Zurich and ETH start-up company Scrona achieve a new world record! They have printed a color picture depicting clown fishes around their sea anemone home. This picture is as tiny as the cross-sectional area...